Microstructure of Copper Films Deposited on TiN Substrate by Metallorganic Chemical Vapor Deposition
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چکیده
منابع مشابه
Microstructure of Metallorganic Chemical Vapor Deposited Aluminum Coatings on Ti6242 Titanium Alloy
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ژورنال
عنوان ژورنال: Journal of The Electrochemical Society
سال: 2002
ISSN: 0013-4651
DOI: 10.1149/1.1423643